司书浩，男，1986年出生，山东济南人。于德国伊尔梅瑙工业大学获得工学博士学位。长期从事纳米压印光刻及相关微纳加工工艺的研发和工作。以第一作者在行业权威期刊发表论文5篇，另外共同作者2篇，在行业顶尖和权威国际会议做口头报告10余次，受邀在行业顶尖会议EIPBN(3-beams)做口头报告1次。
教育经历
2004-2008，山东大学信息科学与工程学院，学士
2007-2009，德国不来梅大学，交流
2009-2012，德国卡塞尔大学，硕士
2012-2018，德国伊尔梅瑙工业大学，工学博士
工作经历
2015-2019，德国伊尔梅瑙工业大学，研究员 (Scientific Researcher/Wissenschaftliche Mitarbeiter)
2017-2021，德国公司5microns GmbH，项目工程师 (Project Engineer/Projektingenieur)
招生方向
光学工程，微纳加工
研究方向
纳米压印光刻，光学与光电器件微纳加工工艺
科研项目
2018.11-2019.11，TU-Ilmenau/Microresist Technology，Development of New Commercial Nanoimprint Resist
2016.05-2019.04，德国联邦教育与研究部(BMBF)，Key Technology Nanointegration Utilized for Spectroscopic Sensor Systems
2014.01-2017.09，欧盟EU FP7-ICT，SwIFT – Non-volatile optical Switch combining Integrated Photonics and Fluidics Technologies
2014.10-2017.03，德国联邦教育与研究部(BMBF)，1D-based Sensors for Gas and Magnetic Field Measurements
2016.10-2018.03，德国联邦教育与研究部(BMBF)，Thermopile Sensor Based on Surface Micromechanics for Pyrometry Applications
2008.05-2013.10，德国联邦教育与研究部(BMBF)，Tunable Optical Sensor Array
论文成果
1. Shuhao Si, C.Weigel, M.Messerschmidt, M.W.Thesen, S.Sinzinger, S.Strehle, “A study of imprint and etching behavior on fused silica of a new tailored resist mr-NIL213FC for Soft UV-NIL”, Micro and Nano Engineering, Vol. 6, 100047, April 2020,
DOI: 10.1016/j.mne.2020.100047
2. Shuhao Si, Martin Hoffmann, “Image inverting, topography and feature size manipulation using organic/inorganic bi-layer lift-off for nanoimprint template”, Microelectronic Engineering, Volume 197, 5 October 2018, Pages 39-44,
DOI: 10.1016/j.mee.2018.05.005
3. Sarah Günther, Shuhao Si, Herbert D’Heer, Dries Van Thourhout, Martin Hoffmann, “FDTS as Dewetting Coating for an Electrowetting Controlled Silicon Photonic Switch”, IEEE Photonics Technology Letters, Volume: 30, Issue: 23, Dec.1, 1 2018,
DOI: 10.1109/LPT.2018.2874351
4. Shuhao Si, Lars Dittrich, Martin Hoffmann, “The NanoTuFe - Fabrication of large area periodic nanopatterns with tunable feature sizes at low cost”, Microelectronic Engineering, Volume 180, 5 August 2017, Pages 71-80,
DOI: 10.1016/j.mee.2017.06.002
5. S. Günther, C. Endrödy; Shuhao Si, S. Weinberger, R. Claes; Y. Justo; H. D'heer; A. Neft; M. Hoffmann, “EWOD system designed for optical switching”, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), pp. 1329-1332
DOI: 10.1109/MEMSYS.2017.7863665
6. Shuhao Si, Martin Hoffmann, “Consecutive imprinting performance of large area UV nanoimprint lithography using bi-layer soft stamps in ambient atmosphere”, Microelectronic Engineering, Volume 176, 25 May 2017, Pages 62-70,
DOI: 10.1016/j.mee.2017.01.032
7. Shuhao Si, Lars Dittrich, Martin Hoffmann, “Low-cost fabrication of nanoimprint templates with tunable feature sizes at a constant pitch”, Microelectronic Engineering, Volume 170, 25 February 2017, Pages 34-38,
DOI: 10.1016/j.mee.2016.12.023
专利成果：
Shuhao Si, Sarah Degenhardt, “Active optical switch system with anti-wetting coating”, EP3510431A1, WO2018049399A1, 2018
